Please use this identifier to cite or link to this item: http://repository.elizadeuniversity.edu.ng/jspui/handle/20.500.12398/263
Title: Spin-hall-active platinum thin films grown via atomic layer deposition
Authors: Schlitz, Richard
Amusan, Akinwumi A.
Lammel, Michaela
Schlicht, Stefanie
Tynell, Tommi
Bachmann, Julien
Woltersdorf, Georg
Nielsch, Kornelius
Goennenwein, Sebastian T. B.
Thomas, Andy
Keywords: Spintronics
ALD
Issue Date: May-2018
Publisher: AIP Publishing
Abstract: We study the magnetoresistance of yttrium iron garnet/Pt heterostructures in which the Pt layer was grown via atomic layer deposition (ALD). Magnetotransport experiments in three orthogonal rotation planes reveal the hallmark features of spin Hall magnetoresistance. To estimate the spin transport parameters, we compare the magnitude of the magnetoresistance in samples with different Pt thicknesses. We check the spin Hall angle and the spin diffusion length of the ALD Pt layers against the values reported for high-quality sputter-deposited Pt films. The spin diffusion length of 1.5 nm agrees well with that of platinum thin films reported in the literature, whereas the spin Hall magnetoresistance Δρ/ρ=2.2×10−5 is approximately a factor of 20 smaller compared to that of our sputter-deposited films. Our results demonstrate that ALD allows fabricating spin-Hall-active Pt films of suitable quality for use in spin transport structures. This work provides the basis to establish conformal ALD coatings for arbitrary surface geometries with spin-Hall-active metals and could lead to 3D spintronic devices in the future.
URI: https://aip.scitation.org/doi/10.1063/1.5025472
http://repository.elizadeuniversity.edu.ng/jspui/handle/20.500.12398/263
Appears in Collections:Research Articles

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