Please use this identifier to cite or link to this item: http://repository.elizadeuniversity.edu.ng/jspui/handle/20.500.12398/626
Title: An effective vision technique for microchip lead inspection
Authors: Mir-Nasiri, Nazim
Al-Obaidy, Haitham H. L.
Salami, Momoh-Jimoh E.
Amin, Shamsuddin
Keywords: Inspection
Semiconductor device measurement
Manufacturing industries
Pattern matching
Performance evaluation
Fault detection
Image processing
Filtering
Morphological operations
Calibration
Issue Date: 10-Dec-2003
Publisher: IEEE
Citation: Mir-Nasiri, N., Al-Obaidy, H. H., Salami, M. J., & Amin, S. (2003, December). An effective vision technique for microchip lead inspection. In IEEE International Conference on Industrial Technology, 2003 (Vol. 1, pp. 135-139). IEEE.
Abstract: A new effective method for the microchip lead inspection for the chip manufacturing industry has been developed in this work. In contrast to the gray scale pattern matching technique this approach employs selected parameters of binary blobs to perform fault detection and measurements. This leads to a significant reduction of image processing time. A special combination of gray level filtering techniques with gray morphological operations enhances the borders of the lead images. Newly developed threshold calibration technique significantly improves the measurement accuracy. A unique statistical analysis has been developed to identify all possible lead defects in the chips. This method is rotationally and scale invariant and able to detect defective leads for the chips with different specifications. The minimum required information about the microchip is the number of leads.
URI: 10.1109/ICIT.2003.1290256
http://repository.elizadeuniversity.edu.ng/jspui/handle/20.500.12398/626
Appears in Collections:Research Articles

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