Spin-hall-active platinum thin films grown via atomic layer deposition

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dc.contributor.authorSchlitz, Richard
dc.contributor.authorAmusan, Akinwumi A.
dc.contributor.authorLammel, Michaela
dc.contributor.authorSchlicht, Stefanie
dc.contributor.authorTynell, Tommi
dc.contributor.authorBachmann, Julien
dc.contributor.authorWoltersdorf, Georg
dc.contributor.authorNielsch, Kornelius
dc.contributor.authorGoennenwein, Sebastian T. B.
dc.contributor.authorThomas, Andy
dc.date.accessioned2019-07-04T11:45:56Z
dc.date.available2019-07-04T11:45:56Z
dc.date.issued2018-05
dc.description.abstractWe study the magnetoresistance of yttrium iron garnet/Pt heterostructures in which the Pt layer was grown via atomic layer deposition (ALD). Magnetotransport experiments in three orthogonal rotation planes reveal the hallmark features of spin Hall magnetoresistance. To estimate the spin transport parameters, we compare the magnitude of the magnetoresistance in samples with different Pt thicknesses. We check the spin Hall angle and the spin diffusion length of the ALD Pt layers against the values reported for high-quality sputter-deposited Pt films. The spin diffusion length of 1.5 nm agrees well with that of platinum thin films reported in the literature, whereas the spin Hall magnetoresistance Δρ/ρ=2.2×10−5 is approximately a factor of 20 smaller compared to that of our sputter-deposited films. Our results demonstrate that ALD allows fabricating spin-Hall-active Pt films of suitable quality for use in spin transport structures. This work provides the basis to establish conformal ALD coatings for arbitrary surface geometries with spin-Hall-active metals and could lead to 3D spintronic devices in the future.en_US
dc.description.sponsorshipDeutsche Forschungsgemeinschaften_US
dc.identifier.urihttps://aip.scitation.org/doi/10.1063/1.5025472
dc.identifier.urihttp://repository.elizadeuniversity.edu.ng/handle/20.500.12398/263
dc.language.isoenen_US
dc.publisherAIP Publishingen_US
dc.subjectSpintronicsen_US
dc.subjectALDen_US
dc.titleSpin-hall-active platinum thin films grown via atomic layer depositionen_US
dc.typeArticleen_US
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